PVD

  • Varian XM-90
  • Varian-3000
  • Varian-M2000
  • Varian-M2i
  • Varian-MB2
  • Endura
  • Fronos

More info

CVD

  • Concept-One
  • Concept 2 Sequel
  • Concept 2 Altus
  • Concept 2 Speed
  • Ultima

More info

Asher

  • L3510
  • PEP3510

More info

CMP

  • EBARA EPO222
  • Mira Mesa

More info

Chemical

  • Si Source
  • Ti Source
  • Zr Source
  • Hf Source
  • other Source

More info

Etching System

E-MAX

Process: Poly Etch
Wafer Size : 8"
Electrostatic chuck (ESC)
Normal : 3 Chamber, Max : 4Chamber

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Centura DPS

Unibody Chamber
Chamber Liner
Diffusion Plasma Shield
STI Process Progress
WSix / Poly Etch simulaneously progress

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