CVD

  • Concept-One
  • Concept 2 Sequel
  • Concept 2 Altus
  • Concept 2 Speed
  • Ultima

More info

Etcher

  • E-MAX
  • Centura DPS

More info

Asher/CMP

Asher

  • L3510
  • PEP3510

CMP

  • EBARA EPO222
  • Mira Mesa

More info

Chemical

  • Si Source
  • Ti Source
  • Zr Source
  • Hf Source
  • other Source

More info

Battery

  • FPD Equipments
  • Cell Equipments

More info

Physical Vapor Deposition

Varian XM-90

Varian - Inline System
Back & Front side deposition process
Wafer Size : 4" to 6"
Versamag Source
Option : Etch, Deposition
Meterial : Al, Ti, Au, Ag, Ni, Cr, Va

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Varian-3000 Series

Varian - Inline System
3180 / 3190 / 3280 / 3290
Wafer Size : 4" to 6"
ConMag & Quantum Source
Option : Etch, 3 Deposition, VIPS
Meterial : Al, Ti, TiW, Au, Ag

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Varian-M2000

Varian - Cluster System
Wafer Size : 5" to 8"
Dual cassette loadlock
Option : Degas, Cool, Etch, Deposition, CDS Deposition
Meterial : Al, Ti, TiN, Tiw, Au

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Varian-M2i

Varian - Cluster System
Wafer Size : 5" to 8"
Dual cassette loadlock
Option : Degas, Cool, Etch, Deposition, CDS Deposition
Meterial : Al, Ti, TiN, Tiw, Au

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Varian-MB2

Varian - Cluster System
Wafer Size : 6" to 8"
Dual cassette loadlock

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Endura

AMAT - Cluster System
Wafer Size : 6" to 8"
ConMag & Quantum Source
Option : Robot arm, Loadlock body, Degas,
          Cool, Pre-II, IMP, CDS Deposition,
          SIP, Heater, E-chuck (Lo/Hi temp)
Meterial : Al, Ti, TiN, TiW, WSi, MOCVD

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Fronos

Maestech - Inline System
Wafer Size : 6" to 8"
Back & Front side deposition process
Option : Etch, Deposition
Meterial : Al, Ti, Au, Ag, Ni, Cr, Va

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